DNP Accelerates Development of Photomask Manufacturing Process for 2nm Generation EUV Lithography
DAI NIPPON PRINTING S/ADR (DNPLY)
NASDAQ:AMEX Investor Relations:
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Source: Business Wire
- Participate in NEDO R&D Project as Rapidus subcontractor - TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support Extreme Ultra-Violet (EUV) lithography, the cutting-edge process for semiconductor manufacturing.This press release features multimedia. View the full release here: https://www.businesswire.com/news/home/20240319148117/en/Image of EUV lithography with pellicle, a protective film for the photomask (Photo: Business Wire)DNP will also act as a subcontractor and provide the newly developed technology to Tokyo-based Rapidus Corporation (Rapidus). Rapidus is participating in the Research and Development Project of the Enhanced Infrastructures for Post-5G Information and Communication Systems instigated by the New Energy and Industrial Technology Development Organization (NEDO).[Background]We have strengthened our ability to manufactu
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