DNP Achieves 10nm Line Pattern Resolution on Nanoimprint Template for Cutting-Edge Semiconductors
DAI NIPPON PRINTING S/ADR (DNPLY)
NASDAQ:AMEX Investor Relations:
dnp.co.jp/eng/investors
Company Research
Source: Business Wire
- Supports 1.4nm Generation Semiconductors, Reduces Manufacturing Costs and Energy Consumption - TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint lithography (NIL) template featuring a circuit line width of 10 nanometers (nm: 10-9 meter). The new template enables patterning for logic semiconductors equivalent to the 1.4nm generation and meets the miniaturization needs of cutting-edge logic semiconductors.This press release features multimedia. View the full release here: https://www.businesswire.com/news/home/20251208175160/en/Template for nanoimprintBackground and AimsIn line with the shift to more sophisticated devices seen in recent years, demands have emerged for even greater miniaturization in cutting-edge semiconductors, leading to advances in Extreme Ultra-Violet (EUV) lithography-based production. EUV lithography, however, requires substantial capital investment, energy consumption, and operating costs
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