Fujifilm to Present Latest Advanced Lithography Research at SPIE Advanced Lithography + Patterning 2026 Conference
FUJIFILM HLDGS CORP ADR (FUJIY)
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Source: Business Wire
TOKYO--(BUSINESS WIRE)--FUJIFILM Corporation will present the company’s latest research findings at SPIE Advanced Lithography + Patterning 2026 (SPIE 2026), taking place February 22-26, 2026, in San Jose, California. The international conference is organized by SPIE, the international society for optics and photonics.As part of its growth strategy aiming to double revenue in the semiconductor materials business to 500 billion yen (3.26B $USD) by FY2030 compared with FY2024, Fujifilm is focusing on the fast-growing advanced resist market—particularly for AI semiconductors—with the goal of expanding its market share.At SPIE 2026, researchers from FUJIFILM Corporation will highlight progress in Extreme Ultraviolet (EUV)*1 resist technologies, nanoimprint lithography (NIL)*2 resists and PFAS-free*3 resists. These cutting-edge technologies contribute to further miniaturization and performance improvement in semiconductor manufacturing and form a key pillar supporting Fujifilm’s materia
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